Crystallization and surface morphology of thermally treated Ag/SiO2 thin films
DOI:
https://doi.org/10.15381/rif.v18i2.11580Keywords:
Ag thin films, thermal crystallization, thermal treatmentAbstract
In this work, the structural and morphological properties of 60 nm thick silver thin films growth on SiO2 substrates and thermally treated at different temperatures from 250 to 1000℃ are studied. We found that the silver thin film is crystallized in the [111] direction when the annealing temperature is increased and the surface roughness evolves forming islands. However, between the annealing temperatures from 800 to 900℃ a change in the preferred orientation to the [200] direction is observed. This change is discussed in terms of the diffusion processes.
Downloads
Published
Issue
Section
License
Copyright (c) 2015 R. M. Calle, L. De Los Santos, A. Bustamante, J. Angulo, C. H. W. Barnes
This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License.
THE AUTHORS RETAIN THEIR RIGHTS:
a. The authors retain their trademark and patent rights, as well as any process or procedure described in the article.
b. The authors retain the right to share, copy, distribute, perform and publicly communicate the article published in the Revista de Investigación de Física (for example, place it in an institutional repository or publish it in a book), with an acknowledgment of its initial publication in the Revista de Investigación de Física.
c. The authors retain the right to make a subsequent publication of their work, to use the article or any part of it (for example: a compilation of their works, notes for conferences, thesis, or for a book), provided that they indicate the source. of publication (authors of the work, journal, volume, number and date).
