Microstructural analysis of nanostructured Zn O thin films

Authors

  • M.A. Urbina-Yarupetán Universidad Nacional Mayor de San Marcos, Lima, Perú
  • Juan Gonzalez Universidad Nacional de Ingeniería y Tecnología, Barranco, Perú

DOI:

https://doi.org/10.15381/rif.v23i2.20297

Keywords:

reactive magnetron sputtering, ZnO thin film, SEM, XRR, XRD

Abstract

We present the experimental results obtained from microstructural analysis of ZnO thin lms with
20, 50, and 100 nm in thickness, grown onto the commercial glass substrate by reactive sputtering.
We analyze the quantitative information on the size of the crystalline domains, the texture direction
of the nanocolumns, their densities, thicknesses, surface and interface roughness obtained through
characterization techniques such as scanning electron microscope (SEM), X-ray reectivity (XRR)
and X-ray diraction (DRX).

Downloads

Published

2020-12-25

Issue

Section

Article

How to Cite

Microstructural analysis of nanostructured Zn O thin films. (2020). Revista De Investigación De Física, 23(2), 26-31. https://doi.org/10.15381/rif.v23i2.20297