A METHOD OF MEASURING THERMAL STABILITY IN DELTA-DOPING

Authors

  • Alfred Zehe Facultad de Ciencias Físicas, Universidad Nacional Mayor de San Marcos Ap. Postal 14-0149, Lima 14, Perú. Facultad de Ciencias Electrónicas, Benemérita Universidad Autónoma de Puebla, Ap. Posta/1505. 72000 Puebla, México
  • Eusebio Torres Tapia Facultad de Ciencias Físicas, Universidad Nacional Mayor de San Marcos Ap. Postal 14-0149, Lima 14, Perú
  • Araceli Ramírez bFacultad de Ciecias Electrónicas, Benemérita Universidad Autónoma de Puebla, Ap. Posta/1505. 72000 Puebla, México.

DOI:

https://doi.org/10.15381/rif.v8i02.8550

Keywords:

Superlattice, planar doping, luminescence, donor-acceptor pair, thermal stability, geometrical arrangement.

Abstract

A new superlattice in semiconductors is discussed which allows to determine the geometrical stability and precision of delta-doping layers in respect to migration and diffusion effects, and even a technological evaluation of the production devíce. This structure acts as inner probe in doping superlattices quite as the known case of enlarged wells in composition superlattices does. Donor - acceptor - pair luminescence radiation is used, which in its dependence on the pair separation distance reflects the geometrical arrangement of neighboring delta­ doped layers provided both donors and acceptors are present in each sheet.

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Published

2005-12-30

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How to Cite

A METHOD OF MEASURING THERMAL STABILITY IN DELTA-DOPING. (2005). Revista De Investigación De Física, 8(02), 19-25. https://doi.org/10.15381/rif.v8i02.8550